Adamantane Derivatives: The Robust Cornerstone of Photoresists and Functional Materials 

Application Domain Background

193nm Core Materials for Immersion Lithography ， As semiconductor process nodes move toward 7nm、5nm Even advancing to smaller process nodes, lithography technology has moved from 248nm ( Christian Democratic Party ) Leap to 193nm ( ArF ) and its immersion lithography technology. This breakthrough poses a revolutionary challenge to photoresist materials: traditional benzene-ring-containing resins in 193nm Absorption is too strong at the given wavelength, rendering it unusable; meanwhile, conventional alicyclic resins lack sufficient resistance to plasma etching.

Adamantane ( Adamantane ), this cage-like hydrocarbon with a diamond-like structure perfectly resolves this contradiction. It in 193nm It exhibits high transparency, while its rigid cage-like structure provides excellent thermal stability and resistance to dry etching. Dry-Etch Resistance ). Therefore, adamantane-based (methyl)acrylate monomers have become indispensable in modern high-end photoresist formulations. “ Skeleton ” Materials.

Functional monomer ( Acrylates & Methacrylates ) 

This product series serves as the direct raw material for the polymerization of photoresist resins. 

CAS 121601-93-2: 1- Adamantyl acrylate 

Applications: Similar to the methacrylate version, but with different polymerization kinetics; used to tune the resin’s molecular weight distribution and flexibility.  。    

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Adamantane Derivatives: The Robust Cornerstone of Photoresists and Functional Materials 

Application Domain Background

193nm Core Materials for Immersion Lithography ， As semiconductor process nodes move toward 7nm、5nm Even advancing to smaller process nodes, lithography technology has moved from 248nm ( Christian Democratic Party ) Leap to 193nm ( ArF ) and its immersion lithography technology. This breakthrough poses a revolutionary challenge to photoresist materials: traditional benzene-ring-containing resins in 193nm Absorption is too strong at the given wavelength, rendering it unusable; meanwhile, conventional alicyclic resins lack sufficient resistance to plasma etching.

Adamantane ( Adamantane ), this cage-like hydrocarbon with a diamond-like structure perfectly resolves this contradiction. It in 193nm It exhibits high transparency, while its rigid cage-like structure provides excellent thermal stability and resistance to dry etching. Dry-Etch Resistance ). Therefore, adamantane-based (methyl)acrylate monomers have become indispensable in modern high-end photoresist formulations. “ Skeleton ” Materials.

Functional monomer ( Acrylates & Methacrylates ) 

This product series serves as the direct raw material for the polymerization of photoresist resins. 

CAS 121601-93-2: 1- Adamantyl acrylate 

Applications: Similar to the methacrylate version, but with different polymerization kinetics; used to tune the resin’s molecular weight distribution and flexibility.  。