Jiangsu Juming Chemical Technology Co., Ltd.
Product Description
4-Chloromethylstyrene (pure ortho isomer), CAS 1592-20-7
Applications: Used as a core polymerization monomer for the synthesis of high-performance negative-tone photoresist resins (such as E-beam electron-beam lithography resists) and advanced packaging dielectric materials, as well as for the production of homogeneous ion-exchange membranes, ultrapure water resins, and chelating resins.
The product is highly prone to self-polymerization; therefore, a specific ppm-level inhibitor—such as TBC (tert-butylcatechol)—is typically added at the factory to ensure stability. Strict cold-chain transportation and low-temperature storage (usually at 2–8°C or lower) are essential. The primary purpose of the cold chain is to prevent polymerization, allowing the inhibitor to remain effective and prolong the product’s shelf life.
4-Chloromethylstyrene (pure ortho isomer), CAS 1592-20-7
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Product Description
4-Chloromethylstyrene (pure ortho isomer), CAS 1592-20-7
Applications: Used as a core polymerization monomer for the synthesis of high-performance negative-tone photoresist resins (such as E-beam electron-beam lithography resists) and advanced packaging dielectric materials, as well as for the production of homogeneous ion-exchange membranes, ultrapure water resins, and chelating resins.
The product is highly prone to self-polymerization; therefore, a specific ppm-level inhibitor—such as TBC (tert-butylcatechol)—is typically added at the factory to ensure stability. Strict cold-chain transportation and low-temperature storage (usually at 2–8°C or lower) are essential. The primary purpose of the cold chain is to prevent polymerization, allowing the inhibitor to remain effective and prolong the product’s shelf life.
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