Adamantane Derivatives: The Robust Cornerstone of Photoresists and Functional Materials

Application Domain Background

193nm Core Materials for Immersion Lithography ， As semiconductor process nodes move toward 7nm、5nm Even advancing to smaller process nodes, lithography technology has moved from 248nm （ Christian Democratic Party ) Leap to 193nm （ ArF ) and its immersion lithography technology. This breakthrough poses a revolutionary challenge to photoresist materials: traditional benzene-ring-containing resins in 193nm Absorption is too strong at the given wavelength, rendering it unusable; meanwhile, conventional alicyclic resins lack sufficient resistance to plasma etching.

Adamantane ( Adamantane ), this cage-like hydrocarbon with a diamond-like structure perfectly resolves this contradiction. It in 193nm It exhibits high transparency, while its rigid cage-like structure provides excellent thermal stability and resistance to dry etching. Dry-Etch Resistance ). Therefore, adamantane-based (methyl)acrylate monomers have become indispensable in modern high-end photoresist formulations. “ Skeleton ” Materials.

Functional monomer ( Acrylates & Methacrylates )

This product series serves as the direct raw material for the polymerization of photoresist resins.

CAS 16887-36-8: 1- Adamantyl methacrylate (ADAMA)

Application: This is the most basic and versatile highly corrosion-resistant monomer. It imparts a high glass transition temperature to polymers ( Tg ) and exceptional etch resistance, serving as a rigid backbone for the photoresist polymer chain.  。 

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Adamantane Derivatives: The Robust Cornerstone of Photoresists and Functional Materials

Application Domain Background

193nm Core Materials for Immersion Lithography ， As semiconductor process nodes move toward 7nm、5nm Even advancing to smaller process nodes, lithography technology has moved from 248nm （ Christian Democratic Party ) Leap to 193nm （ ArF ) and its immersion lithography technology. This breakthrough poses a revolutionary challenge to photoresist materials: traditional benzene-ring-containing resins in 193nm Absorption is too strong at the given wavelength, rendering it unusable; meanwhile, conventional alicyclic resins lack sufficient resistance to plasma etching.

Adamantane ( Adamantane ), this cage-like hydrocarbon with a diamond-like structure perfectly resolves this contradiction. It in 193nm It exhibits high transparency, while its rigid cage-like structure provides excellent thermal stability and resistance to dry etching. Dry-Etch Resistance ). Therefore, adamantane-based (methyl)acrylate monomers have become indispensable in modern high-end photoresist formulations. “ Skeleton ” Materials.

Functional monomer ( Acrylates & Methacrylates )

This product series serves as the direct raw material for the polymerization of photoresist resins.

CAS 16887-36-8: 1- Adamantyl methacrylate (ADAMA)

Application: This is the most basic and versatile highly corrosion-resistant monomer. It imparts a high glass transition temperature to polymers ( Tg ) and exceptional etch resistance, serving as a rigid backbone for the photoresist polymer chain.  。