Adamantane Derivatives: The Robust Cornerstone of Photoresists and Functional Materials

Application Domain Background

193nm Core Materials for Immersion Lithography ， As semiconductor process nodes move toward 7nm、5nm Even advancing to smaller process nodes, lithography technology has moved from 248nm ( Christian Democratic Party ) Leap to 193nm ( ArF ) and its immersion lithography technology. This breakthrough poses a revolutionary challenge to photoresist materials: traditional benzene-ring-containing resins 193nm Absorption is too strong at the given wavelength, rendering it unusable; meanwhile, conventional alicyclic resins lack sufficient resistance to plasma etching.

Adamantane ( Adamantane ), this cage-like hydrocarbon with a diamond-like structure perfectly resolves this contradiction. It in 193nm It exhibits high transparency, while its rigid cage-like structure provides excellent thermal stability and resistance to dry etching. Dry-Etch Resistance ). Therefore, adamantane-based (methyl)acrylate monomers have become indispensable in modern high-end photoresist formulations. “ Skeleton ” Materials.

Functional monomer ( Acrylates & Methacrylates )

This product series serves as the direct raw material for the polymerization of photoresist resins.

CAS 115372-36-6: 3- Hydroxyl -1- Adamantyl methacrylate (HAMA)

Application: This is currently ArF One of the most frequently used monomers in photoresists. It combines the high Tg Its properties and hydroxyl adhesion characteristics make it the preferred balancing material for formulation engineers.  。   

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Adamantane Derivatives: The Robust Cornerstone of Photoresists and Functional Materials

Application Domain Background

193nm Core Materials for Immersion Lithography ， As semiconductor process nodes move toward 7nm、5nm Even advancing to smaller process nodes, lithography technology has moved from 248nm ( Christian Democratic Party ) Leap to 193nm ( ArF ) and its immersion lithography technology. This breakthrough poses a revolutionary challenge to photoresist materials: traditional benzene-ring-containing resins 193nm Absorption is too strong at the given wavelength, rendering it unusable; meanwhile, conventional alicyclic resins lack sufficient resistance to plasma etching.

Adamantane ( Adamantane ), this cage-like hydrocarbon with a diamond-like structure perfectly resolves this contradiction. It in 193nm It exhibits high transparency, while its rigid cage-like structure provides excellent thermal stability and resistance to dry etching. Dry-Etch Resistance ). Therefore, adamantane-based (methyl)acrylate monomers have become indispensable in modern high-end photoresist formulations. “ Skeleton ” Materials.

Functional monomer ( Acrylates & Methacrylates )

This product series serves as the direct raw material for the polymerization of photoresist resins.

CAS 115372-36-6: 3- Hydroxyl -1- Adamantyl methacrylate (HAMA)

Application: This is currently ArF One of the most frequently used monomers in photoresists. It combines the high Tg Its properties and hydroxyl adhesion characteristics make it the preferred balancing material for formulation engineers.  。